JPH0741151Y2 - マスクガラス等の温度測定機構 - Google Patents
マスクガラス等の温度測定機構Info
- Publication number
- JPH0741151Y2 JPH0741151Y2 JP1985022448U JP2244885U JPH0741151Y2 JP H0741151 Y2 JPH0741151 Y2 JP H0741151Y2 JP 1985022448 U JP1985022448 U JP 1985022448U JP 2244885 U JP2244885 U JP 2244885U JP H0741151 Y2 JPH0741151 Y2 JP H0741151Y2
- Authority
- JP
- Japan
- Prior art keywords
- holder
- temperature measuring
- mask glass
- contact probe
- probe pin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000011521 glass Substances 0.000 title claims description 29
- 238000009529 body temperature measurement Methods 0.000 title description 5
- 239000000523 sample Substances 0.000 claims description 22
- 239000012212 insulator Substances 0.000 claims description 12
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 9
- 238000002360 preparation method Methods 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Measuring Temperature Or Quantity Of Heat (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985022448U JPH0741151Y2 (ja) | 1985-02-19 | 1985-02-19 | マスクガラス等の温度測定機構 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985022448U JPH0741151Y2 (ja) | 1985-02-19 | 1985-02-19 | マスクガラス等の温度測定機構 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61138248U JPS61138248U (en]) | 1986-08-27 |
| JPH0741151Y2 true JPH0741151Y2 (ja) | 1995-09-20 |
Family
ID=30514750
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985022448U Expired - Lifetime JPH0741151Y2 (ja) | 1985-02-19 | 1985-02-19 | マスクガラス等の温度測定機構 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0741151Y2 (en]) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0693438B2 (ja) * | 1986-12-11 | 1994-11-16 | 大日本スクリ−ン製造株式会社 | 基板温度測定装置 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5744543U (en]) * | 1980-08-27 | 1982-03-11 | ||
| JPS57162431A (en) * | 1981-03-31 | 1982-10-06 | Jeol Ltd | Method for exposure to electron beam |
-
1985
- 1985-02-19 JP JP1985022448U patent/JPH0741151Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61138248U (en]) | 1986-08-27 |
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